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process chamber 예문

예문

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  1. The CIS anode may be viewed as a high conductance tube connected directly to the process chamber.
  2. The input gases enter the remote plasma source and are transported to the main process chamber to react.
  3. On the other hand, depositions and etches process entire wafers at once, without the need for wafer stage motion in the process chamber.
  4. In 1987, Applied introduced a CVD machine called the Precision 5000, which differed from existing machines by incorporating diverse processes into a single machine that had multiple process chambers.
  5. Monitoring the ambient with a thermocouple has only recently become feasible, in that the high temperature ramp rates prevent the wafer from coming to thermal equilibrium with the process chamber.
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